[1]谢　飞,何家文.渗氮-气相沉积TiN 复合处理层 膜基间“黑色层” 组织的形成与控制[J].常州大学学报(自然科学版),2001,(02):5-8.
　XIE Fei,HE Jia -w en.The Formation and Controlling of “Black Layer” Between the Fi lm and Substrate of the Duplex -treated Layer by Nitriding and Vapor Deposited TiN[J].Journal of Changzhou University(Natural Science Edition),2001,(02):5-8.
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渗氮-气相沉积TiN 复合处理层 膜基间“黑色层” 组织的形成与控制()
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常州大学学报(自然科学版)[ISSN:2095-0411/CN:32-1822/N]

卷:
期数:
2001年02期
页码:
5-8
栏目:
出版日期:
2001-06-25

文章信息/Info

Title:
The Formation and Controlling of “Black Layer” Between the Fi lm and Substrate of the Duplex -treated Layer by Nitriding and Vapor Deposited TiN
作者:
谢　飞1 ;  何家文2
1.江苏石油化工学院机械工程系, 江苏 常州 213016;2.西安交通大学金属材料强度国家重点实验室, 陕西西安 710049
Author(s):
XIE Fei1 ;  HE Jia -w en2
1 .Department of Mechanical Eng ineering , Jiang su Insti tute of Pet rochemical Technolog y , Changzhou 213016 , China ;2 .State Key Labo ratory for Mechanical Behavior of Materials , Xi' an Jiaotong University , Xi' an 710049 , China
关键词:
渗氮; 气相沉积; 复合处理; “ 黑色层”
Keywords:
ni triding ; vapor deposition ; duplex t reatment ; black layer
分类号:
TG 174.444 ;TG 156.8 +2
文献标志码:
A
摘要:
通过对渗氮层中连续化合物层(“ 白亮层”) 的稳定性与气相沉积工艺特性的分析, 从热力学和动力学两方面分析了渗氮 -气相沉积TiN 复合处理时“ 黑色层” 的形成机理。研究认为“ 黑色层” 系由渗氮“ 白亮层” 分解而来。热力学上, 渗氮“ 白 亮层” 不稳定, 在钛离子作用下易于生成TiN 。当气相沉积时的等离子体提供活性钛及离子轰击产生位错和空位时, 即从动力 学上促进转变发生, 形成“ 黑色层” ;同时, “ 黑色层” 能否形成还与气氛氮势、体系温度有关。上述分析可以完满解释文献中 有关“ 黑色层”
Abstract:
The stability of continuous (“white layer”)nitride in the nitrided case and the characteristics of vapo r deposition processes have been studied .The fo rmation of “black layer” in the duplex t reatment of nit riding and vapor deposit ion of TiN film has been investig ated from the points of thermo -dynamics and kinetics .It is shown that the “black layer” results from the decomposi tion of the “w hite layer” .The ” white layer” in the nitrided case is unstable and ready to decompose when being acted by Ti + impact .In addition , plasma during the deposition supplies active atoms and ion bombardment creates dislocations and v acancies , both of which enhance the above t ransfo rmation and result in “black layer” .The formation of “black layer” is also cont rolled by the nitrogen potential and system temperature in the deposit ion chamber .Experimental results in references over the formation of the “black layer” can be explained by these analyses .Ways for avoiding the fo rmation of the “black layer” are given .

参考文献/References:

[1] 谢飞, 何家文, 马宝钿.氮化-气相沉积硬质薄膜复合处理技 术与应用[J] .机械工艺师, 1997 (7):29 .
[2] Gredic T , Zlat anovic M , Popovic N , et al.Propert ies of TiN Coat ings Deposit ed ont o Hot Work St eel Subst rates Plasma Ni trided at Low Pressure [J] .Surf Coat Technol , 1992 , 54/ 55 :502 -507 .
[3] Van Stappen M , Malliet B , St als L , et al.Characterization of TiN Coatings Deposit ed on Plasma Nit rided Tool S teel S urfaces [J] . Mat er Sci Eng , 1991 , A140 :554 -562 .
[4] Sun Y , Bell T .Plasma Surface Engineering of Low Allow S teel [J] .M ater S ci Eng , 1991 , A140 :419 -434 .
[5] Dingremont N , Pianelli A , Bergmann E , et al.Analysis of Compatibilit y of Plasma -nit rided S teels wi th Cerami c Coatings Deposit ed by the Ion -plating Technique [J] .Surf Coat Technol , 1993 , 61 :187 -193 .
[6] Michel H , Gant ois M , Luiten C H .Heat T reatment [M] .London :Met al S ociety , 1984.1 -8 .
[7] 谢飞.离子渗氮-等离子体增强化学气相沉积TiN 膜复合处 理研究[D] .西安:西安交通大学, 1997 .
[8] АверинВ В, РевякинА В, ФежорченкоВ И, et al.Азотв меаллах[M] .Мскова:Металлураця, 1976 .11 .
[9] 山中久彦.离子渗氮[M] .李贻锦, 朱雅年, 译.北京:机 械工业出版社, 1985.10 .
[10] 谢飞, 何家文.高速钢W18Cr4V 离子渗氮层组织对TiN 膜 与基体结合强度的影响[J] .金属学报, 2000 , 36 (10):1 099 -1 103 .

相似文献/References:

[1]谢　飞.渗氮-气相沉积硬质膜复合处理技术及其发展[J].常州大学学报(自然科学版),2001,(04):38.
　XIE Fei.Technique and Development of Duplex Treatment of Nitriding and Vapor Deposition of Hard Fi lms[J].Journal of Changzhou University(Natural Science Edition),2001,(02):38.

备注/Memo

备注/Memo:
作者简介:谢飞(1964 -), 男, 上海人, 博士, 副教授, 主要从事材料表面工程方面的研究。
更新日期/Last Update: 2001-06-25