[1]谢　飞,何家文.循环氩离子轰击对等离子体增强化学气相沉积(PECVD)TiN 膜耐腐蚀性能的影响[J].常州大学学报(自然科学版),2000,(02):27-30.
　XIE Fei,HE Jia -w en.The Ef fect of Repeated Ar + Bombardment on the Corrosion Resistance of Plasma -enhanced Chemical Vapour Deposited (PECVD)TiN Film[J].Journal of Changzhou University(Natural Science Edition),2000,(02):27-30.
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循环氩离子轰击对等离子体增强化学气相沉积(PECVD)TiN 膜耐腐蚀性能的影响()
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常州大学学报(自然科学版)[ISSN:2095-0411/CN:32-1822/N]

卷:
期数:
2000年02期
页码:
27-30
栏目:
出版日期:
2000-06-25

文章信息/Info

Title:
The Ef fect of Repeated Ar + Bombardment on the Corrosion Resistance of Plasma -enhanced Chemical Vapour Deposited (PECVD)TiN Film
作者:
谢　飞1 ;  何家文2
1.江苏石油化工学院机械工程系, 江苏 常州 213016;2.西安交通大学材料科学与工程学院, 陕西西安710049
Author(s):
XIE Fei1 ;  HE Jia -w en2
1 .Mechanical Engineering Department , Jiangsu Institute of Pet rochemical Technology , Changzhou 213016 , China ;2 .Materials Science and Engineering School , Xi' an Jiaotong University , Xi' an 710049 , China
关键词:
等离子体增强化学气相沉积; TiN 膜; 耐蚀性; Ar +轰击
Keywords:
PECVD ; titanium nit ride film ; corrosion resistance ; Ar + bombardment
分类号:
TG 174.453
文献标志码:
A
摘要:
设计了循环氩离子轰击-PECVD TiN 工艺。运用扫描电子显微镜、能谱仪、恒电位仪等仪器设备, 研究循环氩离子轰 击对PECVD TiN 膜耐腐蚀性能的影响及作用机理。结果表明:循环氩离子轰击提高了膜层在硝酸和硫酸中的耐腐蚀性能。这 主要是由于循环氩离子轰击强化了沉积中的反应, 细化了TiN 晶粒, 降低了膜层中的残余氯含量。循环氩离子轰击还可能具有 减少膜内缺陷、提高TiN 膜致密性的作用, 从而亦有助于提高膜的耐蚀性。
Abstract:
By analyzing the fo rmation characterist ics of PECVD TiN films , a new process of repeated Ar + bombardment -PECVD TiN is proposed .Scanning electro n microscope (SEM), energy dispersive spect roscope (EDS)and po tentiostat w ere employed to investigate the inf luence and mechanism of repeated Ar + bombardment on the corrosion resistance of the TiN film .The results showed that the repeated Ar + bombardment improved the co rrosion resistance of the TiN film in aqua acuta and sulphuric acid .This is mainly because the repeated Ar + bombardment intensified the chemical reactions in the deposition , made the TiN grains finer , and reduced the residual chlo rine content in the film .The repeated Ar + bombardment may also have the function of making the TiN film more dense and reducing the micro -defects in the film , which is also helpful for improving the film' s co rrosion resistance .

参考文献/References:

[1] Erdemir A , Cart er W B , Hochman R F.A Study of the Corrosion Behaviour of TiN Fi lm s [J] .Mater Sci Eng , 1985 , 69 : 89 .
[2] Wuala U K , Pentt inen I M , Korhonen A S .Im proved Corrosion Resist ance of Physical Vapou r Deposi tion Coat ed TiN and ZrN [J] .Surf Coat Technol, 1990 , 41 :191 -204 .
[3] 赵化桥.等离子体化学与工艺[M] .合肥:中国科学技术大 学出版社, 1993.11 .
[4] 白辰东.等离子体化学气相沉积TiN 基硬质镀层膜基结合强 度及腐蚀行为的研究[D] .西安:西安交通大学, 1994 .
[5] 袁国栋, 王瑞莉.等离子体化学气相沉积(PCVD) [A] .李 恒德, 肖纪美.材料表面与界面[C] .北京:清华大学出版 社, 1990.90 , 91 .
[6] 谢飞.离子渗氮-等离子体增强化学气相沉积TiN 膜复合处 理研究[D] .西安:西安交通大学, 1997 .
[7] Haller I.Importance of Chain React ions in the Plasma Deposi tion of Hydrogenat ed Amorphous Silicon [J] .J Vac S ci Technol , 1983 , A1 :1 376 -1 382 . The

相似文献/References:

[1]谢飞.残余氯在等离子体增强化学气相沉积 TiN 膜中的偏聚过程研究[J].常州大学学报(自然科学版),2004,(01):1.
　XIE Fei.Segregation of Residual Chlorine in Plasma- Enhanced Chemical Vapor Deposited TiN Film[J].Journal of Changzhou University(Natural Science Edition),2004,(02):1.
[2]谢　飞,何家文.离子氮化-PECVD TiN 膜复合处理 提高切边模具寿命研究[J].常州大学学报(自然科学版),2001,(01):24.
　XIE Fei,HE Jia -w en.Prolonging the Service Life of Edge-Cutting Die by Duplex Treatment of Plasma Nitr iding-PECVD TiN Film[J].Journal of Changzhou University(Natural Science Edition),2001,(02):24.

备注/Memo

备注/Memo:
作者简介:谢飞(1964 -), 男, 上海人, 副教授, 博士, 主要从事材料表面工程方面的研究。
更新日期/Last Update: 2000-06-25